Surface Analysis

3D Optical Profiler

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Surface Analysis- 3D Optical Profiler

Optical profilometry is a non-contact metrology technique for surface analysis and topography characterization. The technique provides 2D and 3D images of a surface as well as numerous surface texture parameters such as Ra-, Sa- and Sz-values.

Typical measurements include:

  • Surface roughness
  • Step height/depth
  • Dimensions
  • 3D imaging

Veeco Wyko NT9100 system and 4.1 Vision analysis software.

Optical Profilometry
3D image showing wear on a needle
Optical Profilometry
3D-image of a performed scratch test (PVD coated TiN on high speed steel. Load 100 N)
Optical Profilometry

Surface Analysis- Auger Electron Spectroscopy (AES)

Auger electron spectroscopy is an analytical technique for elemental analysis of very thin films or small features. The information depth and lateral resolution for AES are in the order of nanometers. In combination with a sputtering ion gun, AES can also offer depth profiling. AES can be performed as point or area analysis, line scans and mappings.

Typical applications:

  • Surface cleanliness of medical implants
  • Chemical analysis of thin stains
  • Depth characterizations of oxide films
  • Chemical analysis of small features (<1 µm)

Physical electronics (PHI) 700Xi Scanning Auger Nanoprobe.

Auger Electron Spectroscopy
AES spectra of sediments from: water (red), 70Etanol (green), reference (blue)
Auger Electron Spectroscopy

Surface Analysis-
Secondary Ion Mass Spectrometry (ToF-SIMS)

Time of flight Secondary ion mass spectrometry is a technique that provides elemental, chemical state, and molecular information from surfaces of solid materials. The detection limit in ToF-SIMS is in the ppm range which makes the technique very surface sensitive. In combination with a sputtering ion gun, ToF-SIMS can also offer depth profiling. ToF-SIMS can be performed as point or area analysis, line scans and mappings

Typical applications:

  • Analysis of different deposits
  • Chemical state determinations
  • Analysis of trace elements

Physical electronics (PHI) Trift II.

Substance on implant.

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